DeepScaleTool : A Tool for the Accurate Estimation of Technology Scaling in the Deep-Submicron Era
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The estimation of classical CMOS "constant-field" or "Dennard" scaling methods that define scaling factors for various dimensional and electrical parameters have become less accurate in the deep-submicron regime, which drives the need for better estimation approaches especially in the educational and research domains. We present DeepScaleTool, a tool for the accurate estimation of deep-submicron technology scaling by modeling and curve fitting published data by a leading commercial fabrication company for silicon fabrication technology generations from 130 nm to 7 nm for the key parameters of area, delay, and energy. Compared to 10 nm–7 nm scaling data published by a leading foundry, the DeepScaleTool achieves an error of 1.7 and 5 estimation method that achieves an error of 24 24.9
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